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Positive photo resist

7. KL 5300 Photoresist for IC fabrication
ㆍ  KL 7000 series 출시로 단종 예정.
ㆍ  Positive photo resist
ㆍ  CD: 0.55 μm
Thickness: 0.15 μm - 2.5 μm
ㆍ  Application: IC fabrication, interference or holographic lithography, diffraction grating
KL 5300 positive photo resist for IC fabrication
Description
Sample process
 - KL5300 is a positive photoresist optimized for i-Line, g-Line, and 
   broadband applications.
 - KL5300 offers high sensitivity, and high throughput suitable for
   IC fabrication.
 - Film Thickness range of 0.15 – 2.5 μm.
 - Designed for use with industry standard 0.26 N TMAH         
   developers.
 - Application: Integrated circuits, Interference lithography,
   Diffraction grating.
 Substrate 150 mm Si  Exposure NSR-1755g7a
 Dehydration NA Thickness 1.31 μm
 HMDS 100 °C, 40 sec PEB 115 °C, 60 sec
 Track Tel Mark V Develop 23 °C, 60 sec,
s-puddle
 SoftBake 90 °C, 60 sec HardBake 110 °C, 60 sec
KL 5300  Spin Curve
KL 5302 Spin Curve
KL 5300 Positive Photo Resist Spin curve
KL 5302 Positive Photo Resist Spin curve

Process results
KL 5300 Positive Photo Resist 1.5 micro film thickness
1.5 μm film thickness
KL 5300 Positive Photo Resist CD 0.55 micro at 1.5 micro film thickness
CD: 0.55 μm
Related Products (Guide for Kemlab Positive Photoresists)
Product Suite
Tone / Exposure
Product
Film Thickness (μm)
0.2
0.5
0.8
1
1.3
2
2.5
3
4
5
6
7
8
9
10
20
30
40
50
100
KL 5302 Hi-Res
  Interference Lithography (Link)  		Positive
  i-Line, Broadband, g-line  		KL 5302 Hi-Res                    
                    
KL 5300
General Purpose
(Link)		Positive
i-Line, Broadband, g-line		KL 5302                    
KL 5305                    
KL 5310                    
KL 5315                    
KL 6000
General Purpose Thick
(Link)		Positive
i-Line, Broadband, g-line		KL 6003                    
KL 6005                    
KL 6008                    
K-PRO
Packaging Resist (Link)		Positive
i-Line, Broadband, g-line		K-PRO 1                    
K-PRO 2                    
K-PRO 3                    
K-PRO 5                    
K-PRO 7                    
K-PRO 15                    
Related Products (Guide for Kemlab Neative Photoresists)
Product Suite
Tone / Exposure
Product
Film Thickness (μm)
0.20.50.811.322.534567891020304050100
HARE SQ
Negative Epoxy (Link)		Negative
Epoxy Resist
i-Line, Broadband
MEMS, Microfluidics		SQ 2                    
SQ 5                    
SQ 10                    
SQ 25                    
SQ 50                    
KL Image Reversal
Lift Off (Link)		Positive / Negative
i-Line, Broadband, g-line		KL IR Lift-Off 15                    
KL IR 15                    
APOL-LO 3200
  Negative Lift Off Profle (Link)		Negative undercut profile
i-Line, Broadband		APOL-LO 3202                    
APOL-LO 3204                    
APOL-LO 3207                    
KL NPR
  Vertical Profile (Link)		Negative vertical profile
i-Line and Broadband		KL NPR 1                    
KL NPR 2                    
KL NPR 4                    
KL NPR 6                    
KL NPR 10