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Positive photo resist

8. AZ GXR 601 Positive Photo Resist
ㆍ  AZ GXR 601 Positive Photo Resist
ㆍ  Viscosity: 14 CP and 46 CP.
AZ GXR 601 Positive Photo Resist
Description
Process conditions
 - Positive photoresist.

 - Viscosity: AZ GXR 601 (14 CP).
                AZ GXR 601 (46 CP).

 - Film Thickness range: about 0.8 μm to 1.5 μm (14 CP).
                               about 2 μm to 4.5 μm (46 CP).

 - Shelf life: 3 to 6 months.
Soft bake90 °C, 60 secSoft bake90 °C, 90 sec
FT1.00 μmFT2.94 μm
ExposureALS 200 I-line stepper (NA=0.45)ExposureASML/250, i-line stepper COG reticle
PEB110 °C, 60 secPEB110 °C, 90 sec
Development23 °C, 60 sec, 300MIF 2.38% TMAHDevelopment23 °C, 60 sec, 300MIF 2.38% TMAH