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Negative photo resist

2. HARE-SQ High Aspect Ratio Epoxy Photoresist
ㆍ  High aspect ratio epoxy negative photo resist
ㆍ  SU-8 공정과 호환
Thickness: 2 μm - 100 μm
ㆍ  Application: MEMS, Microfluidics, Sensors, Pixel arrays
ㆍ  저렴한 가격. 0.5 L, 1 L, 4 L 이외 용량 선택 가능
ㆍ  납기일: 3~5주 (평균 납기일: 24일, 2018년 납품 기준)
HARE-SQ High Aspect Ratio Epoxy Negative Photoresist
Description
Properties
  HARE-SQ is an epoxy based negative photoresist designed for
 polymeric MEMS, microfluidics, micromachining and  other
 microelectronic applications.

  The HARE-SQ system is designed for use in thick film applications
 of 2 to 100 microns,and is ideal for use in permanent applications
 in which the photoresist remains within the finished device.		 - The HARE-SQ photoresist uses an epoxy resin with superior
   cleanliness and excellent reproducibility.
  - Consistent surface energy of crosslinked resist, (an important
   property for microfluidic applications).
  - Fully compatible with SU-8 processes.
  - Application: MEMS, Microfluidics, Sensors, Pixel arrays.

Film thickness vs. Spin speed
Percent transmittance vs. Wavelength
TF_612x444px.jpg
Transmittance_612x444px.jpg

Process Guide
Product:
Film thickness @ 2000 rpm		SQ-2
2 μm		SQ-5
5 μm		SQ-10
10 μm		SQ-25
25 μm		SQ-50
50 μm		SQ-50
100 μm
Softbake (2 step)65 °C for 1 min
95 °C for 1 min		65 °C for 1 min
95 °C for 3 min		65 °C for 2 min
95 °C for 5 min		65 °C for 3 min
95 °C for 7 min		65 °C for 5 min
95 °C for 15 min		65 °C for 10 min
95 °C for 30 min
Expose (broadband) on Si200 mJ/cm2180 mJ/cm2180 mJ/cm2180 mJ/cm2180 mJ/cm2180 mJ/cm2
Post Exposure Bake (2 step)65 °C for 1 min
95 °C for 1 min		65 °C for 1 min
95 °C for 1 min		65 °C for 1 min
95 °C for 2 min		65 °C for 1 min
95 °C for 3 min		65 °C for 1 min
95 °C for 4 min		65 °C for 2 min
95 °C for 10 min
Develop (immersion)1 min1 min2.5 min3.5 min6 min15 min

Process results
HARE_SQ_logo_ports_in_50um_film.jpg
Logo & posts in 50 μm film
HARE_SQ_5um_line_space_in_25um_film.jpg
5 μm dense line/space in 25 μm film
Related Products (Guide for Kemlab Positive Photoresists)
Product Suite
Tone / Exposure
Product
Film Thickness (μm)
0.2
0.5
0.8
1
1.3
2
2.5
3
4
5
6
7
8
9
10
20
30
40
50
100
KL 5302 Hi-Res
  Interference Lithography (Link)  		Positive
  i-Line, Broadband, g-line  		KL 5302 Hi-Res                    
                    
KL 5300
General Purpose
(Link)		Positive
i-Line, Broadband, g-line		KL 5302                    
KL 5305                    
KL 5310                    
KL 5315                    
KL 6000
General Purpose Thick
(Link)		Positive
i-Line, Broadband, g-line		KL 6003                    
KL 6005                    
KL 6008                    
K-PRO
Packaging Resist (Link)		Positive
i-Line, Broadband, g-line		K-PRO 1                    
K-PRO 2                    
K-PRO 3                    
K-PRO 5                    
K-PRO 7                    
K-PRO 15                    
Related Products (Guide for Kemlab Neative Photoresists)
Product Suite
Tone / Exposure
Product
Film Thickness (μm)
0.2 0.5 0.8 1 1.3 2 2.5 3 4 5 6 7 8 9 10 20 30 40 50 100
HARE SQ
Negative Epoxy (Link)		 Negative
Epoxy Resist
i-Line, Broadband
MEMS, Microfluidics		 SQ 2                                        
SQ 5                                        
SQ 10                                        
SQ 25                                        
SQ 50                                        
KL Image Reversal
Lift Off (Link)		 Positive / Negative
i-Line, Broadband, g-line		 KL IR Lift-Off 15                                        
KL IR 15                                        
APOL-LO 3200
  Negative Lift Off Profle (Link)		 Negative undercut profile
i-Line, Broadband		 APOL-LO 3202                                        
APOL-LO 3204                                        
APOL-LO 3207                                        
KL NPR
  Vertical Profile (Link)		 Negative vertical profile
i-Line and Broadband		 KL NPR 1                                        
KL NPR 2                                        
KL NPR 4                                        
KL NPR 6                                        
KL NPR 10