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Negative photo resist

7. KL NPR - Vertical Profile Photo Resist
ㆍ  Negative photo resist with Vertical profile
ㆍ  Thickness: about 1 μm - 20 μm
Exposure: i-line and broadband
ㆍ  저렴한 가격. 0.5 L, 1 L, 4 L 이외 용량 선택 가능
ㆍ  납기일: 3~5주
KL NPR - Vertical Profile Negative Photo Resist
Description
Properties
 - KL NPR is a negative tone, novolac photoresist designed for
  eletroplating, metal deposition, TSV, and RIE etch.
 - Vertical Profile and high aspect ratios.
 - Thick vertical porfile (straight wall).
 - Film Thickness range 1 – 20 μm.
 - Designed for use with industry standard TMAH, KOH developers.
 - A possible customizing to thickness.

Processing Guidelines
           
NPR 1
  (FT: 1 μm)		NPR 2
  (FT: 2 μm)		NPR 4
  (FT: 4 μm)		NPR 6
  (FT: 6 μm)		NPR 10
  (FT: 10 μm)
Spin coat45 sec
@ 2000 RPM		45 sec
@ 2000 RPM		45 sec
@ 2000 RPM		45 sec
@ 2000 RPM		45 sec
@ 2000 RPM
Soft bake90 sec
@ 110 ⁰C		90 sec
@ 110 ⁰C		90 sec
@ 110 ⁰C		90 sec
@ 110 ⁰C		120 sec
@ 110 ⁰C
Exposure
(Broadband
on Si)		45 mJ/cm250 mJ/cm265 mJ/cm270 mJ/cm275 mJ/cm2
PEB90 sec
@ 110 ⁰C		90 sec
@ 110 ⁰C		90 sec
@ 110 ⁰C		90 sec
@ 110 ⁰C		120 sec
@ 110 ⁰C
Development
(0.26N TMAH)		15 - 30 sec30 sec45 sec60 sec90 sec

KL NPR Spin Curve
KL NPR Optical Parameters
KL NPR Negative Photo Resist with Vertical Profiles Spin curve.
KL NPR Negative Photo Resist with Vertical Profiles Optical Parameters.

Process results
10um posts in 25um film thickness
10 μm posts in 25 μm film thickness
15um line and space in 25um film thickness
15 μm line and space in 25 μm film thickness
5um post on Si substrate
5 μm posts on Si substrate
7um line and space on Cu substrate
7 μm line and space on Cu substrate
Related Products (Guide for Kemlab Positive Photoresists)
Product Suite
Tone / Exposure
Product
Film Thickness (μm)
0.2
0.5
0.8
1
1.3
2
2.5
3
4
5
6
7
8
9
10
20
30
40
50
100
KL 5302 Hi-Res
  Interference Lithography (Link)  		Positive
  i-Line, Broadband, g-line  		KL 5302 Hi-Res                    
                    
KL 5300
General Purpose
(Link)		Positive
i-Line, Broadband, g-line		KL 5302                    
KL 5305                    
KL 5310                    
KL 5315                    
KL 6000
General Purpose Thick
(Link)		Positive
i-Line, Broadband, g-line		KL 6003                    
KL 6005                    
KL 6008                    
K-PRO
Packaging Resist (Link)		Positive
i-Line, Broadband, g-line		K-PRO 1                    
K-PRO 2                    
K-PRO 3                    
K-PRO 5                    
K-PRO 7                    
K-PRO 15                    
Related Products (Guide for Kemlab Neative Photoresists)
Product Suite
Tone / Exposure
Product
Film Thickness (μm)
0.20.50.811.322.534567891020304050100
HARE SQ
Negative Epoxy (Link)		Negative
Epoxy Resist
i-Line, Broadband
MEMS, Microfluidics		SQ 2                    
SQ 5                    
SQ 10                    
SQ 25                    
SQ 50                    
KL Image Reversal
Lift Off (Link)		Positive / Negative
i-Line, Broadband, g-line		KL IR Lift-Off 15                    
KL IR 15                    
APOL-LO 3200
  Negative Lift Off Profle (Link)		Negative undercut profile
i-Line, Broadband		APOL-LO 3202                    
APOL-LO 3204                    
APOL-LO 3207                    
KL NPR
  Vertical Profile (Link)		Negative vertical profile
i-Line and Broadband		KL NPR 1                    
KL NPR 2                    
KL NPR 4                    
KL NPR 6                    
KL NPR 10