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Home > 제품소개 > Positive ebeam resist
- E-beam resist product list
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E-beam resist product list
Type
Resist
Description
Thinner
Developer
Remover
Positive
AR-P 617
Copolymer, highest resolution 2x more sensitiver than PMMA, lift-off
600-07
600-50
600-55600-71
300-76PMMA 50K, 120K, 200K, 495K, 600K, 950K anisole, highest resolution, process stable, universally simple processing
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PMMA-Dev
PMMA-Rev
AR-P 639-679
PMMA 50K, 200K, 600K, 950K ethyl lactate, highest resolution, process stable, universally simple processing
600-09
300-55
300-56600-71
300-76Very hig resolution (< 10 nm) and aspect ratio (> 50:1 @ 100 kV), specifically designed to fit into a standard PMMA process
600-02
600-55
600-56600-71
300-76AR-P 6200
Thick PMMA films up to 250 μm for MST, synchrotron
300-12
600-51
600-56600-71
300-76AR-P 7400
Mix&match, high resolution, plasma etching-resistant, also neg.
300-12
300-47
300-26600-71
300-76Negative
AR-N 7500
Mix&match, high resolution, plasma etching-resistant, also pos./neg.
300-12
300-47
600-71
300-73AR-N 7520
newMix&match, highly sensitive, highest resolution
300-12
300-46
300-47600-71
300-73AR-N 7520
Mix&match, highly sensitive, high-precision edges
300-12
300-47
300-76
300-73AR-N 7700
CAR, high resolution, high sensitivity, steep gradation
300-12
300-46
300-47300-76
300-73AR-N 7720
CAR, high resolution, flat gradation for 3-dimens. struct
300-12
300-46
300-47300-76
300-72Special
ApplicationConductive coating lyaer for the dissipation of charges e-beam resists
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DI water
IPAAdhesion promoter photo and e-beam resists
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-
DI water
IPA
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