Home > 제품소개 > Positive ebeam resist
Description |
Applications | |
- HARP PMMA (polymethyl methacrylate) resist is designed for high resolution direct write e-Beam lithography. - When combined with HARP-C copolymer the HARP multi-layer system is ideal for T-gate manufacture. - HARP PMMA has excellent adhesion to a wide variety of substrates, and is used as a protective coating layer for wafer thinning and sacrificial layers. - 판매 용량: 500 ml, 1 L and 4 L. |
- e-beam direct write lithography. - Multi-layer T-gate manufacture. - X-Ray LIGA. - Protective Coating for wafer thinning. |
Product Offering |
Results | |
1000 HARP eB - Highest Mw (molecular weight) PMMA polymer. - Manufactured in Anisole. - Best resolution & contrast PMMA. - Competes with 950K PMMA. 500 HARP eB - PMMA Polymer with mid-range Mw (molecular weight). - Faster throughput versus 1000 HARP eB. - Manufactured in Anisole. - Competes with 495K PMMA. HARP-C - MMA/MAA (methyl methacrylate/methacrylic acid) copolymer. - Manufactured in Ethyl Lactate. - Used in multi-layer process with PMMA. - Competes with MMA(8.5)MAA. |
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HARP PMMA & Copolymer Products | ||||||||||||||||||||||||||||||||||||||||
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Spin Curves | |
Spin Curve: 500 HARP PMMA Series (thin) |
Spin Curve: 500 HARP PMMA Series (thick) |
Spin Curve: 1000 HARP PMMA Series (thin) |
Spin Curve: 1000 HARP PMMA Series (thick) |
Spin Curve: HARP-C Copolymer Series |
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