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제품소개

  • Wafer
  • Photo resist
  • E-beam resist
  • Spin coater & Hot plate
  • WETSEM
  • Coming soon

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Home > 제품소개 > E-beam resist

E-beam resist

1. Developer and Remover
ㆍ  Developer of PMMA and SML resist.
ㆍ  Remover of PMMA and SML resist.
ㆍ  1 liter 단위로 판매 (최소 용량: 1 L).
Developer and Remover
 Developers
 A range of developers can be used with PMMA and SML resist, these are typically a varying mixture of MIBK and IPA depending on what resolution and throughput is requried.
 We can also supply a developer based on IPA:water. It has been found to improve sensitivity, contrast and  exposure latitude when compared to MIBK:IPA mixtures [1].

Developers Range
ProductResolutionSensitivity / Throughput
PMMA-Dev1MediumHigh
PMMA-Dev2HighMedium
PMMA-Dev3Very HighLow
MIBK (Pure)LowHigh
IPA:WaterVery HighVery High

 Removers
 PMMA and SML resist that has been soft-baked can be removed using standard laboratory solvents that we can provide (acetone).
 For hard  baked resist, a stronger solution of KOH yields excellent results.