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Home > 제품소개 > Negative ebeam resist

Negative ebeam resist

1. E-beam resist product list
ㆍ  Positive and negative e-beam resist, copolymer, conductive resist
ㆍ  DisCharge, AR-PC 5000: 저렴한 ESPACER 대응 제품
ㆍ  SML Resist: 저렴한 ZEP 대응 제품
ㆍ  AR-P 617: Copolymer, lift-off application
ㆍ  저렴한 PMMA 950K, 600K, 495K, 200K,120K, 50K resist
ㆍ  SurPass, AR 300-80, HMDS: Adhesion promoter
E-beam resist product list

이외 다양한 제품 및 대응 제품을 취급하고 있습니다. 찾으시는 제품이 없는 경우 문의 주시길 바랍니다.

 E-beam resist product list

Type

Resist

Description

Thinner

Developer

Remover

Positive

 AR-P 617

 Copolymer, highest resolution 2x more sensitiver than PMMA, lift-off

 600-07

 600-50
 600-55

 600-71
 300-76

 PMMA

 PMMA 50K, 120K, 200K, 495K, 600K, 950K anisole, highest resolution, process stable, universally simple processing

 -

 PMMA-Dev

 PMMA-Rev

 AR-P 639-679

 PMMA 50K, 200K, 600K, 950K ethyl lactate, highest resolution, process stable, universally simple processing

 600-09

 300-55
 300-56

 600-71
 300-76

 SML Resit

 Very hig resolution (< 10 nm) and aspect ratio (> 50:1 @ 100 kV), specifically designed to fit into a standard PMMA process

 600-02

 600-55
 600-56

 600-71
 300-76

 AR-P 6200

 Thick PMMA films up to 250 μm for MST, synchrotron

 300-12

 600-51
 600-56

 600-71
 300-76

 AR-P 7400

 Mix&match, high resolution, plasma etching-resistant, also neg.

 300-12

 300-47
 300-26

 600-71
 300-76

Negative

 AR-N 7500

 Mix&match, high resolution, plasma etching-resistant, also pos./neg.

 300-12

 300-47

 600-71
 300-73

 AR-N 7520
 new

 Mix&match, highly sensitive, highest resolution

 300-12

 300-46
 300-47

 600-71
 300-73

 AR-N 7520

 Mix&match, highly sensitive, high-precision edges

 300-12

  300-47

 300-76
 300-73 

 AR-N 7700

 CAR, high resolution, high sensitivity, steep gradation

 300-12

 300-46
 300-47 

 300-76
 300-73

 AR-N 7720

 CAR, high resolution, flat gradation for 3-dimens. struct

 300-12

 300-46
 300-47

 300-76
 300-72

Special
Application

 Discharge

 Conductive  coating lyaer for the dissipation of charges e-beam resists

 -

 -

 DI water
 IPA

 SurPass

 Adhesion promoter photo and e-beam resists

 -

 -

 DI water
 IPA