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Features |
Properties | ||||||
- Positive e-beam resist. - Molecular Weights: 950K, 495K, 350K, 120K, 35K. - Dilution: < 1% up to 18% (depending on molecular weight). - 판매 용량: 250 ml to 30 L. - Flexible Distribution: 500 ml 이상 두께 별 250 ml로 선택 가능. 예). 1L 구매 시 아래와 같이 선택 가능. 1. 950K A2: 250ml x 1bottle. 2. 495K A7: 250ml x 1bottle. 3. 120K A10: 500ml x 1bottle. |
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Spin Curves | |
PMMA 950K A2, A4, A6, A7, A8 |
PMMA 495K A2, A4, A6, A8, A11 |
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PMMA 495K A15, A16, A17, A18 |
PMMA 350K A2, A4, A6, A8 |
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PMMA 350K A15, A16, A17, A18 |
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Tone | Product (link) | Film Thickness (nm) | Feature |
Adhesion Promoter | SurPass series | NA | Apply resist: Novolac, DNQ, PMMA, HSQ, PMGI, SU-8, SML, PI, ... |
Negative ebeam resist | HSQ series | 8 – 1,650 | Dilution: 1 - 45%. Supply: Powder, Solution. |
H-SiQ series | 25 – 850 | Dilution: 2 - 20%. Supply: Powder, Solution. | |
AR-N 7520 New series | 100 – 800 | Best resolution: 28 nm. e-beam, DUV, i-line. | |
Positive ebeam resist | HARP PMMA series | 50 – 3,700 | m/W: 950K, 495K. Dilution: 2 - 11 %. |
HARP-C Copolymer series | 150 – 1,100 | MMA/MAA Copolyer. Dilution: 6 - 12 %. | |
PMMA series | 40 – 7,000 | m/W: 950K, 495K, 350K, 120K, 35K. Dilution: 1 - 18 %. | |
Copolymer series | 100 – 1,100 | Copolymer. Dilution: 1 - 13 %. | |
SML series | 50 – 4,800 | High resolution: 5 nm. Aspect ratio: >50:1. Slow etch rate. | |
Conductive layer | DisCharge H2O series | 25 – 170 | Apply resist: PMMA, HSQ, mr-PosEBR, AR-P 6200, ZEP, SML. |
Protective Surface Coating | PSC-1003 | 2.4 – 5.3 | Protective Surface Coating |
PSC-IB DPM 1010 | 10 (@ 2000 RPM) | Protective Surface Coating |