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Positive photo resist

2. KL 5300 Photoresist for IC fabrication
ㆍ  Positive photo resist
ㆍ  CD: 0.55 μm
Thickness: 0.15 μm - 2.5 μm
ㆍ  Application: IC fabrication, interference or holographic lithography, diffraction grating
ㆍ  저렴한 가격. 500ml, 1L, 1G 이외 용량 선택 가능
Test sample 제공 가능
ㆍ  납기일: 3~5주 (평균 납기일: 24일, 2018년 납품 기준)
KL 5300 positive photo resist for IC fabrication
Description
Sample process
 - KL5300 is a positive photoresist optimized for i-Line, g-Line, and 
   broadband applications.
 - KL5300 offers high sensitivity, and high throughput suitable for
   IC fabrication.
 - Film Thickness range of 0.15 – 2.5 μm.
 - Designed for use with industry standard 0.26 N TMAH         
   developers.
 - Application: Integrated circuits, Interference lithography,
   Diffraction grating.
 Substrate 150 mm Si  Exposure NSR-1755g7a
 Dehydration NA Thickness 1.31 μm
 HMDS 100 °C, 40 sec PEB 115 °C, 60 sec
 Track Tel Mark V Develop 23 °C, 60 sec,
s-puddle
 SoftBake 90 °C, 60 sec HardBake 110 °C, 60 sec
KL 5300  Spin Curve
KL 5302 Spin Curve
KL 5300 Positive Photo Resist Spin curve
KL 5302 Positive Photo Resist Spin curve

Process results
KL 5300 Positive Photo Resist 1.5 micro film thickness
1.5 μm film thickness
KL 5300 Positive Photo Resist CD 0.55 micro at 1.5 micro film thickness
CD: 0.55 μm
Related Products (Guide for Kemlab Photoresists)
Product Suite
Tone / Exposure
Product
Film Thickness (μm)
0.20.50.811.322.534567891020304050100
KL 5302 Hi-Res
Interference Lithography (Link)
Positive
i-Line, Broadband, g-line
KL 5302 Hi-Res                    
                    
KL 5300
General Purpose
(Link)
Positive
i-Line, Broadband, g-line
KL 5302                    
KL 5305                    
KL 5310                    
KL 5315                    
KL 6000
General Purpose Thick
(Link)
Positive
i-Line, Broadband, g-line
KL 6003                    
KL 6005                    
KL 6008                    
K-PRO
Packaging Resist (Link)
Positive
i-Line, Broadband, g-line
K-PRO 7                    
K-PRO 715                    
                                                                                                                                                                             
Product Suite
Tone / Exposure
Product
Film Thickness (μm)
0.20.50.811.322.534567891020304050100
HARE SQ
Negative Epoxy
(Link)
Negative
Epoxy Resist
i-Line, Broadband
MEMS, Microfluidics
SQ 2                    
SQ 5                    
SQ 10                    
SQ 25                    
SQ 50                    
KL Image Reversal
Lift Off (Link)
Positive / Negative
i-Line, Broadband, g-line
KL IR-15 Lift Off                    
KL IR-15                    
APOL-LO 3200
Negative Lift Off
(Link)
Negative
i-Line, Broadband
APOL-LO 3202                    
APOL-LO 3204                    
APOL-LO 3207