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Positive photo resist

5. KL IR 15 Photoresist for Image Reversal (Lift Off and Vertical profile)
ㆍ  Image Reversal (positive and negative) photo resist
ㆍ  Bake 온도로 positive와 negative tone으로 변경
Version: undercut profile and vertical profile
ㆍ  Thickness: 1.2 μm - 2.5 μm in a single coat
Exposure: i-Line, g-Line and broadband
ㆍ  저렴한 가격. 0.5 L, 1 L, 4 L 이외 용량 선택 가능
ㆍ  납기일: 3~5주 (평균 납기일: 24일, 2018년 납품 기준)
KL IR15 Photoresist for Image Reversal (Lift Off and Vertical profile)
Description
Properties
 - KL IR 15 series image reversal photoresists are used as either
   positive and negative photoresist in i-line, g-line and broadband
   applications.
 - KL IR 15: Designed for straight profiles when used as negative
   photoresist.
 - KL IR Lift-Off 15: Designed for lift-off profiles when used as
   negative photoresist.
KL_IR_15_spin_curve.JPG

Positive Resist Mode
Negative (Vertical or Lift Off) Resist Mode
Softbake 105 °C for 90 seconds
Exposure Broadband, i-lin, g-line
PEB 115 °C for 60 seconds
Development 0.26N TMAH
Removal NMP / DMSO based strippers
Softbake 105 °C for 90 seconds
Exposure Broadband, i-lin, g-line
Reversal Bake (critical step) 130 °C for 120 seconds
Flood Exposure (non-critical) 200 mJ/cm2 (broadband)
Development 0.26N TMAH
Hardbake (optional) 130 °C for 60 seconds
Removal NMP / DMSO based strippers

Process results of KL IR Lift-Off 15
Example Negative tone Lift-Off Process Example Gold Deposition & Lift Off Process
Film Thickness 1.5 microns Film Thickness of PR 1.5 microns
Broadband exposure 100 mJ/cm2 Film Thickness of Gold 150 nm
Develop time 45 seconds puddle (recommended) Adhesion Layer Ti
Results
KL_IR_neg_lift_off_1.jpg KL_IR_neg_lift_off_2.jpg

KL_IR_neg_lift_off_3.jpg
 Results
(2, 3, 4 μm dense line/space after lift off)
KL_IR_neg_lift_off_4.jpg

KL_IR_neg_lift_off_5.jpg

KL_IR_neg_lift_off_6.jpg

Process results of KL IR 15
Example Positive tone Process Negative tone Process
Film Thickness 1.5 microns 1.5 microns
Broadband exposure ~ 70 mJ/cm2 120 mJ/cm2
Develop time 60 seconds puddle (recommended) 60 seconds puddle (recommended)
Results
KL_IR_pos_1.jpg KL_IR_pos.jpg
KL_IR_neg.jpg
Related Products (Guide for Kemlab Positive Photoresists)
Tone
Product (link)
Film Thickness (µm)
Feature
NegativeHARE SQ series2 – 100 and 200*Epoxy.
SQ QuickDry series2 – 200Epoxy, Quick drying solvent.
SQ MicroCoat series0.05 – 2Epoxy, Thin film, Surface protection.
SQ OptiCoat series2 – 100Epoxy, Higher transparency.
APOL-LO 3200 series2 – 10+Lift-off profile.
KL NPR series1 – 20Vertical profile.
Image ReversalKL IR 15,
KL IR Lift-Off 15		1.2 – 2.6Lift-off profile (negative),
Vertical profile (negative).
PositiveKL 7000 series0.15 – 3High resolution, No PFAS and Fluorine.
KL 6000 series2.5 – 11General thick purpose.
K-PRO series0.8 – 25 and 50*Plating and etch application.
Advanced packaging
Protective Surface CoatingPSC-10032.4 – 5.3Protective Surface Coating
PSC-IB DPM 101010 (@ 2000 RPM)Protective Surface Coating
* Double coating.