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| A range of developers can be used with PMMA and SML resist, these are typically a varying mixture of MIBK and IPA depending on what resolution and throughput is requried.
We can also supply a developer based on IPA:water. It has been found to improve sensitivity, contrast and exposure latitude when compared to MIBK:IPA mixtures .
| PMMA and SML resist that has been soft-baked can be removed using standard laboratory solvents that we can provide (acetone).
For hard baked resist, a stronger solution of KOH yields excellent results.