혁신에 열정을 더하다

제품소개

  • Wafer
  • Photo resist
  • E-beam resist
  • Spin coater & Hot plate
  • WETSEM
  • Coming soon

고객센터

Home > 제품소개 > Negative photo resist

Negative photo resist

4. HARE SQ OptiCoat - Optical Gragde Negative Epoxy Photoresist
ㆍ  Optical Grade Negative Epoxy Photoresist
ㆍ  Thickness: 1.5 μm - 100 μm
ㆍ  Application: MEMS, Microfluidics, Sensors, Pixel arrays
ㆍ  저렴한 가격. 0.5 L, 1 L, 4 L, 16 L 이외 용량 선택 가능
ㆍ  납기일: 3~5주
HARE SQ OptiCoat - Optical Grade Epoxy Negative Photoresist
HARE SQ OptiCoat
Description
Advantages
 HARE SQ™ OptiCoat is an advanced epoxy-based negative photoresist for permanent devices with demanding optical parameters such as waveguides and sensors.
 HARE SQ™ OptiCoat is an improved version of HARE SQ™.
 Using patent-pending advanced chemistry, higher transparency can be maintained over a wide temperature range.
 Film thicknesses of 2 to 100 microns can be achieved with a single spin coat.
 - Epoxy resin with superior cleanliness and excellent
    reproducibility.
 - Improved optical stability.
 - Reduced oxidative stress.
 - Fully compatible with SU-8 processes.

 Tone:                 Negative Photoresist
 Film Thickness: Up to 100 μm single coat
 Sensitivity:         NUV, Broadband, i-line
 Developer:         HARE SQ™ Developer

HARE SQ Optical Grade Comparison 25 um FT,
 24 hrs @ 150 C
HARE SQ 25 Optical Grade vs Standard HARE SQ 25
(Oven Testing @ 175 C)
HARE_SQ_OptiCoat_Optical_Grade_Comparison
HARE_SQ_OptiCoat_Optical_Grade_Comparison2

HARE SQ OptiCoat - Spin Speed vs. Film Thickness
HARE_SQ_OptiCoat_Spin_Curve

Process Guide
Product:
Film thickness:
SQ OptiCoat 2
  2 μm
SQ OptiCoat 5
5 μm
SQ OptiCoat 10
10 μm
SQ OptiCoat 25
25 μm
SQ OptiCoat 50
  50 μm
SQ OptiCoat 50
  100 μm
Softbake (2 step) 65 °C for 1 min
95 °C for 1 min
65 °C for 1 min
95 °C for 3 min
65 °C for 2 min
95 °C for 5 min
65 °C for 3 min
95 °C for 7 min
65 °C for 5 min
95 °C for 15 min
65 °C for 10 min
95 °C for 30 min
Expose (broadband) on Si 200 mJ/cm2 180 mJ/cm2 180 mJ/cm2 180 mJ/cm2 180 mJ/cm2 180 mJ/cm2
Post Exposure Bake
(2 step)
65 °C for 1 min
95 °C for 1 min
65 °C for 1 min
95 °C for 1 min
65 °C for 1 min
95 °C for 2 min
65 °C for 1 min
95 °C for 3 min
65 °C for 1 min
95 °C for 5 min
65 °C for 2 min
95 °C for 10 min
Develop (immersion) 1 minute 1 minute 2.5  minutes 3.5 minutes 6 minutes 15 minutes

Process results
HARE_SQ_OptiCoat_Logo_and_posts_in_50_um_film
KemLab Logo and posts in 50 μm film
HARE_SQ_OptiCoat_5_um_dense_line_space_in_25_um_film
5 μm dense line/space in 25 μm film
Related Products (Guide for Kemlab Positive Photoresists)
Product Suite
Tone / Exposure
Product
Film Thickness (μm)
0.2
0.5
0.8
1
1.3
2
2.5
3
4
5
6
7
8
9
10
20
30
40
50
100
KL 5302 Hi-Res
  Interference Lithography (Link)
 
Positive
  i-Line, Broadband, g-line 
KL 5302 Hi-Res                    
                    
KL 5300
General Purpose
(Link)
Positive
i-Line, Broadband, g-line
KL 5302                    
KL 5305                    
KL 5310                    
KL 5315                    
KL 6000
General Purpose Thick
(Link)
Positive
i-Line, Broadband, g-line
KL 6003                    
KL 6005                    
KL 6008                    
K-PRO
Packaging Resist (Link)
Positive
i-Line, Broadband, g-line
K-PRO 1                    
K-PRO 2                    
K-PRO 3                    
K-PRO 5                    
K-PRO 7                    
K-PRO 15                    
Related Products (Guide for Kemlab Neative Photoresists)
Product Suite
Tone / Exposure
Product
Film Thickness (μm)
0.2 0.5 0.8 1 1.3 2 2.5 3 4 5 6 7 8 9 10 20 30 40 50 100
HARE SQ
Negative Epoxy (Link)
Negative
Epoxy Resist
i-Line, Broadband
MEMS, Microfluidics
SQ 2                                        
SQ 5                                        
SQ 10                                        
SQ 25                                        
SQ 50                                        
KL Image Reversal
Lift Off (Link)
Positive / Negative
i-Line, Broadband, g-line
KL IR Lift-Off 15                                        
KL IR 15                                        
APOL-LO 3200
  Negative Lift Off Profle (Link)
Negative undercut profile
i-Line, Broadband
APOL-LO 3202                                        
APOL-LO 3204                                        
APOL-LO 3207                                        
KL NPR
  Vertical Profile (Link)
Negative vertical profile
i-Line and Broadband
KL NPR 1                                        
KL NPR 2                                        
KL NPR 4                                        
KL NPR 6                                        
KL NPR 10