엔엠테크

Photo & e-beam resist

4. HARP PMMA and Copolymer

High Aspect Ratio PMMA and Copolymer for e-Beam resist

PMMA molecular weights: 950K, 495K
Dilutions from 2% up to 11% (other dilution are available upon request)

Thickness: approx. 50 nm - 3700 nm

Copolymer dilutions from 6% up to 12% (other dilution are available upon request)

Thickness: approx. 170 nm - 1100 nm

저렴한 가격. 판매 용량: 0.5 L, 1 L, 4 L.

HARP PMMA and Copolymer ▼

Description	Applications
- HARP PMMA (polymethyl methacrylate) resist is designed for high resolution direct write e-Beam lithography. - When combined with HARP-C copolymer the HARP multi-layer system is ideal for T-gate manufacture. - HARP PMMA has excellent adhesion to a wide variety of substrates, and is used as a protective coating layer for wafer thinning and sacrificial layers. - 판매 용량: 500 ml, 1 L and 4 L.	- e-beam direct write lithography. - Multi-layer T-gate manufacture. - X-Ray LIGA. - Protective Coating for wafer thinning.

Product Offering

Results

1000 HARP eB
- Highest Mw (molecular weight) PMMA polymer.
- Manufactured in Anisole.
- Best resolution & contrast PMMA.
- Competes with 950K PMMA.

500 HARP eB
- PMMA Polymer with mid-range Mw (molecular weight).
- Faster throughput versus 1000 HARP eB.
- Manufactured in Anisole.
- Competes with 495K PMMA.

HARP-C
- MMA/MAA (methyl methacrylate/methacrylic acid) copolymer.
- Manufactured in Ethyl Lactate.
- Used in multi-layer process with PMMA.
- Competes with MMA(8.5)MAA.

100 nm features

40 nm features

HARP PMMA & Copolymer Products

500 HARP PMMA
Product	Approx. FT (μm) @ 2000 RPM	Approx. Viscosity (cst)	Competes with
500 HARP eB 0.07	0.07	5	495K PMMA A2
500 HARP eB 0.15	0.15	9	495K PMMA A3
500 HARP eB 0.2	0.2	14	495K PMMA A4
500 HARP eB 0.3	0.3	21	495K PMMA A5
500 HARP eB 0.4	0.4	32	495K PMMA A6
500 HARP eB 0.7	0.7	63	495K PMMA A8
500 HARP eB 1.5	1.5	169	495K PMMA A11

1000 HARP PMMA
Product	Approx. FT (μm) @ 2000 RPM	Approx. Viscosity (cst)	Competes with
1000 HARP eB 0.1	0.1	8	950K PMMA A2
1000 HARP eB 0.2	0.2	15	950K PMMA A3
1000 HARP eB 0.3	0.3	27	950K PMMA A4
1000 HARP eB 0.4	0.45	47	950K PMMA A5
1000 HARP eB 0.7	0.7	75	950K PMMA A6
1000 HARP eB 1.3	1.3	191	950K PMMA A8
1000 HARP eB 1.7	1.7	282	950K PMMA A9
1000 HARP eB 2.7	2.7	620	950K PMMA A11

HARP-C Copolymer
Product	Approx. FT (μm) @ 2000 RPM	Approx. Viscosity (cst)	Competes with
HARP-C 0.2	0.2	9	8.5 MAA EL 6
HARP-C 0.4	0.4	18	8.5 MAA EL 9
HARP-C 0.5	0.5	22	8.5 MAA EL 10
HARP-C 0.7	0.7	30	8.5 MAA EL 11
HARP-C 0.8	0.8	39	8.5 MAA EL 12

Spin Curves
Spin Curve: 500 HARP PMMA Series (thin)	Spin Curve: 500 HARP PMMA Series (thick)

Spin Curve: 1000 HARP PMMA Series (thin)	Spin Curve: 1000 HARP PMMA Series (thick)

Spin Curve: HARP-C Copolymer Series

Products Guide ▼

Tone	Product (link)	Film Thickness (nm)	Feature
Adhesion Promoter	SurPass series	NA	Apply resist: Novolac, DNQ, PMMA, HSQ, PMGI, SU-8, SML, PI, ...
Negative ebeam resist	HSQ series	8 – 1,650	Dilution: 1 - 45%. Supply: Powder, Solution.
	H-SiQ series	25 – 850	Dilution: 2 - 20%. Supply: Powder, Solution.
	AR-N 7520 New series	100 – 800	Best resolution: 28 nm. e-beam, DUV, i-line.
Positive ebeam resist	HARP PMMA series	50 – 3,700	m/W: 950K, 495K. Dilution: 2 - 11 %.
	HARP-C Copolymer series	150 – 1,100	MMA/MAA Copolyer. Dilution: 6 - 12 %.
	PMMA series	40 – 7,000	m/W: 950K, 495K, 350K, 120K, 35K. Dilution: 1 - 18 %.
	Copolymer series	100 – 1,100	Copolymer. Dilution: 1 - 13 %.
	SML series	50 – 4,800	High resolution: 5 nm. Aspect ratio: >50:1. Slow etch rate.
Conductive layer	DisCharge H2O series	25 – 170	Apply resist: PMMA, HSQ, mr-PosEBR, AR-P 6200, ZEP, SML.
Protective Surface Coating	PSC-1003	2.4 – 5.3	Protective Surface Coating
Protective Surface Coating	PSC-IB DPM 1010	10 (@ 2000 RPM)	Protective Surface Coating

^* Double coating.

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