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Negative photo resist

5. HARE SQ QuickDry - Negative High Aspect Ratio Epoxy Fast Drying Photoresist
ㆍ  Negative High Aspect Ratio Epoxy Fast Drying Photoresist
ㆍ  Thickness: 15 μm - 200 μm
ㆍ  Quick drying solvent for increased throughput
ㆍ  저렴한 가격. 0.5 L, 1 L, 4 L, 16 L 이외 용량 선택 가능
ㆍ  납기일: 3 ~ 5주
HARE SQ™ QuickDry 25-75 - Negative High Aspect Ratio Epoxy Fast Drying Photoresist
Description
Advantages
 - HARE SQ™ QuickDry is an epoxy-based negative photoresist
 designed for polymeric MEMS, microfluidics, micromachining and
 other microelectronic applications. The HARE SQ™ QuickDry
 system is designed for use in thick film applications up to
 200 microns, and utilizes a faster drying solvent system which
 reduces processing times, leading to increased throughput.
  - Tone: Negative
  - Film Thickness: Up to 200 μm single coat
  - Sensitivity: E-beam (possible), NUV, Broadband, i-line
  - Developer: HARE SQ™ Developer
   - HARE SQ™ QuickDry uses an epoxy resin with superior
   cleanliness and excellent reproducibility.
  - Quick drying solvent for increased throughput.
  - High aspect ratio epoxy with vertical sidewalls.
  - Fully compatible with SU-8 2000 processes.

Processing Guidelines
Product:
Film thickness:

 SQ QuickDry 25
  25 μm
@3000 RPM		 SQ QuickDry 35
35 μm
@3000 RPM		 SQ QuickDry 50
50 μm
@3000 RPM		 SQ QuickDry 75
75 μm
@3000 RPM		 SQ QuickDry 75
  100 μm
@1500 RPM
Softbake
(Hot plate)		 95 °C for 5 min 95 °C for 5 min 65 °C for 3 min
95 °C for 7 min		 65 °C for 5 min
  95 °C for 15 min		 65 °C for 5 min
  95 °C for 15 min
Expose
(broadband) on Si		 195 mJ/cm2 195 mJ/cm2 195 mJ/cm2 210 mJ/cm2 240 mJ/cm2
PEB
(Post Exposure Bake)		 95 °C for 5 min 95 °C for 5 min 65 °C for 1 min
  95 °C for 5 min		 65 °C for 1 min
  95 °C for 5 min		 65 °C for 1 min
  95 °C for 5 min
Develop
(immersion)		 4 minutes 5 minutes Bath 1: 4 min
Bath 2: 2 min		 Bath 1: 8 min
Bath 2: 4 min		 Bath 1: 10 min
Bath 2: 5 min

Spin Curves
Spin_Curve_HARE_SQ_QuickDry_25
Spin_Curve_HARE_SQ_QuickDry_35_50_75

HARE SQ QuickDry Transmittance vs. Wavelength
HARE SQ QuickDry Optical parameters
HARE_SQ_QuickDry_Transmittance
HARE_SQ_QuickDry_Optical_parameters

Process results
20 μm features, 100 μm HARE SQ QuickDry coating
20 μm features, 100 μm HARE SQ QuickDry coating
10 μm features, 25 μm HARE SQ QuickDry coating
10 μm features, 25 μm HARE SQ QuickDry coating
10 μm features, 100 μm HARE SQ QuickDry coating
10 μm features, 100 μm HARE SQ QuickDry coating
25 μm features, 50 μm HARE SQ QuickDry coating
25 μm features, 50 μm HARE SQ QuickDry coating
Related Products (Guide for Kemlab Positive Photoresists)
Product Suite
Tone / Exposure
Product
Film Thickness (μm)
0.2
0.5
0.8
1
1.3
2
2.5
3
4
5
6
7
8
9
10
20
30
40
50
100
KL 5302 Hi-Res
  Interference Lithography (Link)  		Positive
  i-Line, Broadband, g-line  		KL 5302 Hi-Res                    
                    
KL 5300
General Purpose
(Link)		Positive
i-Line, Broadband, g-line		KL 5302                    
KL 5305                    
KL 5310                    
KL 5315                    
KL 6000
General Purpose Thick
(Link)		Positive
i-Line, Broadband, g-line		KL 6003                    
KL 6005                    
KL 6008                    
K-PRO
Packaging Resist (Link)		Positive
i-Line, Broadband, g-line		K-PRO 1                    
K-PRO 2                    
K-PRO 3                    
K-PRO 5                    
K-PRO 7                    
K-PRO 15                    
Related Products (Guide for Kemlab Neative Photoresists)
Product Suite
Tone / Exposure
Product
Film Thickness (μm)
0.20.50.811.322.534567891020304050100
HARE SQ
Negative Epoxy (Link)		Negative
Epoxy Resist
i-Line, Broadband
MEMS, Microfluidics		SQ 2                    
SQ 5                    
SQ 10                    
SQ 25                    
SQ 50                    
KL Image Reversal
Lift Off (Link)		Positive / Negative
i-Line, Broadband, g-line		KL IR Lift-Off 15                    
KL IR 15                    
APOL-LO 3200
  Negative Lift Off Profle (Link)		Negative undercut profile
i-Line, Broadband		APOL-LO 3202                    
APOL-LO 3204                    
APOL-LO 3207                    
KL NPR
  Vertical Profile (Link)		Negative vertical profile
i-Line and Broadband		KL NPR 1                    
KL NPR 2                    
KL NPR 4                    
KL NPR 6                    
KL NPR 10